&lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;${L}_{{g}} = {87}$ &lt;/tex-math&gt; &lt;/inline-formula&gt;nm InAlAs/InGaAs High-Electron- Mobility Transistors With a &lt;italic&gt;g&lt;/italic&gt; <sub>m_max</sub> of 3 S/mm and &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;$f_{{T}}$ &lt;/tex-math&gt; &lt;/inline-formula&gt; of 559 GHz

Hyeon-Bhin Jo, Ji-Min Baek, Do-Young Yun, Seungwoo Son, Jung‐Hee Lee, Tae‐Woo Kim, Dae-Hyun Kim, Takuya Tsutsumi, Hiroki Sugiyama, Hideaki Matsuzaki

IEEE Electron Device Letters · 2018 · 29 citations · 11 references

Concepts

Abstract

We present our latest results on L <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">g</sub> = 87 nm InAlAs/InGaAs high-electron-mobility transistors with an excellent combination of dc and high-frequency characteristics. We obtained a maximum transconductance of 3 S/mm at V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DS</sub> = 0.9 V, an ON-resistance of 273 Ω-μm, a current gain cutoff frequency of 559 GHz, and a maximum oscillation frequency of 671 GHz. According to small-signal modeling, these outstanding device metrics are a consequence of the indium-rich InGaAs channel with very high Hall mobility, compact device design with L <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">SD</sub> = 1 μm, and an optimized gate process that yields well-tempered behavior.

References

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