Enhanced p-type conduction in AlGaN grown by metal-source flow-rate modulation epitaxy

Abstract

A metal-source flow-rate modulation epitaxy method is reported to enhance the hole concentration of Mg-doped AlGaN grown by metal organic chemical vapor deposition. The hole concentration of p-type AlGaN (Al content 0.43) is increased to 2.3 × 1017 cm−3 at room temperature by this method, which is about ten times higher than that of the conventional growth. The resistivity was found to be as low as 12.7 Ω·cm. Furthermore, the effective acceptor activation energy (EA) in the AlGaN films (Al content 0.32–0.43) was determined to be 20–22 meV, several times smaller than EA in p-GaN. Secondary ion mass spectroscopy measurements demonstrated that uniformly Mg-doped AlGaN structures with spatially modulated Al compositions were formed using this technique. It is suggested that the enhancement of hole concentration benefits from the modulation of the valence band edge.