2002 · 13 citations · 4 references
EngineeringComputer EngineeringElectrical EngineeringMicroelectronicsMicrofabricationSemiconductor DevicesIntegrated Circuit DesignIntegrated Circuit FabricationMask DesignMask FabricationMicrofabrication ProcessesThin Film LithographyPhase Shift Mask DesignPhase Shift MasksPhase ShiftersPhase-shift LithographyThin Film Mask FabricationThin-film Mask Design
A transparent phase shifting mask has been demonstrated to improve the resolution of the conventional i-line stepper and to facilitate the fabrication of various deep submicron patterns for VLSI. This mask, having a single patterned layer of phase shifter, can be easily fabricated, and it is easy to inspect and repair compared to the conventional phase shifting mask with double patterned layers for the Cr layer and the phase shifter layer. The transparent phase shifting mask is promising for fabricating sub-half-micron patterns for 64 M DRAMs.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
4
Masayuki Endo, Masaru Sasago, Yoshihiko Hirai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1987 · 12 citations