Masaru Sasago

Study of the resist deformation in nanoimprint lithography

Yoshihiko Hirai, Masaki Fujiwara, Takahiro Okuno et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 144 citations

Engineering, Electron-beam Lithography, Mechanical Engineering +19

Mold Surface Treatment for Imprint Lithography.

Yoshihiko Hirai, Satoshi Yoshida, Akio Okamoto et al. · Journal of Photopolymer Science and Technology · 2001 · 106 citations · Full text

Materials Science, Nano Imprint Lithography, Engineering +14

Excimer laser lithography.

Yoshiyuki Tani, Masaru Sasago · Kobunshi · 1990 · 50 citations · Full text

Excimer Laser Lithography, Advanced Laser Processing, Engineering +6

Reduction of line edge roughness in the top surface imaging process

Shigeyasu Mori, Taku Morisawa, Nobuyuki Matsuzawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 45 citations

Engineering, Microscopy, Top Surface +25

Bilayer Resist Method for Room-Temperature Nanoimprint Lithography

Ken-ichiro Nakamatsu, Keiichiro Watanabe, Katsuhiko Tone et al. · Japanese Journal of Applied Physics · 2004 · 42 citations

Engineering, Electron-beam Lithography, Pattern Transfer +17