Concepedia

Phase Shift Masks

Phase Shift Masks is a photolithographic masking technique in semiconductor manufacturing that enhances image resolution by exploiting constructive and destructive interference of light waves through precisely engineered phase-modulating regions on the mask, thereby distinguishing it from conventional binary intensity masks.

281

Publications

9.1K

Citations

920

Authors

215

Institutions

Publications per year

2017–2026

24

Variants

Phase-shift Masks

Parents

Publications

281

Improving resolution in photolithography with a phase-shifting mask

M. D. Levenson, R. A. Simpson · IEEE Transactions on Electron Devices · 1982 · 646 citations

, , +15

Large area patterned magnetic nanostructures

A. O. Adeyeye, Navab Singh · Journal of Physics D Applied Physics · 2008 · 204 citations

, , +17

Phase-shifting masks for microlithography: automated design and mask requirements

Y. C. Pati, T. Kailath · Journal of the Optical Society of America A · 1994 · 155 citations

, , +16

Complex grating structures with uniform phase masks based on the moving fiber–scanning beam technique

W.H. Loh, M.J. Cole, Michalis N. Zervas et al. · Optics Letters · 1995 · 146 citations

, , +16

Double phase-image encryption using gyrator transforms, and structured phase mask in the frequency plane

Hukum Singh, Ashwani Kumar Yadav, Sunanda Vashisth et al. · Optics and Lasers in Engineering · 2014 · 138 citations

, , +12

1–5 of 281

Authors

920

  1. AE
    Andreas Erdmann

    Fraunhofer Institute for Integrated Systems and Device Technology, Germany

    11 publications · 257 citations

    11

    h-index

  2. AB
    Andrew B. Kahng

    University of California San Diego, United States

    8 publications · 167 citations

    8

    h-index

  3. AR
    Andrew R. Neureuther

    University of California, Berkeley, United States

    8 publications · 250 citations

    8

    h-index

  4. MM
    Martin McCallum

    Nikon (United Kingdom), United Kingdom

    8 publications · 108 citations

    8

    h-index

  5. JS
    John S. Petersen

    IMEC, Belgium

    7 publications · 91 citations

    7

    h-index

1–5 of 920

Institutions

215

  1. IBM (United States)

    Armonk, United States

    15 h-index

    67 publications

    4.6K citations

  2. University of California, Berkeley

    Berkeley, United States

    12 h-index

    30 publications

    944 citations

  3. Intel (United States)

    Santa Clara, United States

    10 h-index

    37 publications

    848 citations

  4. Hitachi (Japan)

    Tokyo, Japan

    10 h-index

    39 publications

    1.2K citations

  5. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    8 h-index

    20 publications

    725 citations

  6. Fraunhofer Institute for Integrated Systems and Device Technology

    Erlangen, Germany

    8 h-index

    21 publications

    503 citations

  7. AT&T (United States)

    Bedminster, United States

    8 h-index

    28 publications

    534 citations

  8. IMEC

    Leuven, Belgium

    7 h-index

    13 publications

    269 citations

1–8 of 215

Venues

  1. 23

    h-index

  2. Japanese Journal of Applied Physics

    JJAP · 20 publications · 469 citations

    13

    h-index

  3. Optics Communications

    13 publications · 642 citations

    13

    h-index

  4. 13

    h-index

  5. Optics Express

    10 publications · 490 citations

    10

    h-index

1–5