IEEE Transactions on Electron Devices · 1993 · 47 citations · 6 references
EngineeringElectrical EngineeringElectronic MaterialsMicroelectronicsSemiconductor DevicesDevice ModelingDevice SimulationIon ImplantationMetal-oxide-semiconductor Field-effect TransistorsSemiconductor InterfacesShort-channel EffectsBiasesElectron Impact IonizationGate-dependent Current-voltage BehaviorIon Implantation EffectsIon Implantation Simulation
The nonmonotonic behavior of gate current I/sub g/ as a function of gate-to-source voltage V/sub gs/ is reported for depletion-mode double-implant GaAs MESFETs. Experiments and numerical simulations show that the main contribution to I/sub g/ (in the range of drain biases studied) comes from impact-ionization-generated holes collected at the gate electrode, and that the bell shape of the I/sub g/(V/sub gs/) curve is strongly related to the drop of the electric field in the channel of the device as V/sub gs/ is moved towards positive values.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
6
Statistics of the Recombinations of Holes and Electrons
W. Shockley, W. T. Read · Physical Review · 1952 · 6.4K citations
Impact ionization in GaAs MESFETs
K. Hui, Chenming Hu, P. George et al. · IEEE Electron Device Letters · 1990 · 118 citations
Engineering, Electrical Engineering, Electronic Materials +12