DRAM Using Crystalline Oxide Semiconductor for Access Transistors and Not Requiring Refresh for More Than Ten Days

Tomoaki Atsumi, Shuhei Nagatsuka, Hideko Inoue, Tatsuya Onuki, Toshihiko Saito, Yoshinori Ieda, Yutaka Okazaki, Atsuo Isobe, Yutaka Shionoiri, Kiyoshi Katō,

2012 · 38 citations · 12 references

Concepts

Abstract

We fabricated a dynamic random access memory (DRAM) using crystalline oxide semiconductor (OS) transistors and not requiring refresh for more than ten days. We call this memory a dynamic oxide semiconductor random access memory (DOSRAM). A crystalline oxide semiconductor is an In-Ga-Zn-oxide (IGZO) semiconductor and has a c-axis aligned crystal (CAAC) structure. A crystalline OS transistor has extremely low off-state current. The DOSRAM uses this device for access transistors, and can have a very long refresh cycle. A memory cell array made of a crystalline OS layer can be stacked on peripheral circuits made of a silicon (Si) semiconductor layer; thus, the area of the DOSRAM can be decreased.

References

12