Mechanism of leakage current reduction of tantalum oxide capacitors by postmetallization annealing

Abstract

In this letter, the authors will point out that defect states related to impurities or structural defects in tantalum oxide capacitors can be passivated by hydrogen during postmetallization anneal (PMA) while oxygen vacancies are enhanced by PMA such that some will observe a decrease while other may observe an increase in the leakage current after PMA. The PMA process can be tuned such that the hydrogen passivation of defect states dominates over the enhancement of oxygen vacancies, resulting in significant leakage current reduction.