W. S. Lau

Crystallized Si films by low-temperature rapid thermal annealing of amorphous silicon

R. Kakkad, Jonathan H. Smith, W. S. Lau et al. · Journal of Applied Physics · 1989 · 106 citations

Engineering, Materials Engineering, Materials Science +17

Detection of oxygen vacancy defect states in capacitors with ultrathin Ta2O5 films by zero-bias thermally stimulated current spectroscopy

W. S. Lau, L. L. Leong, Taejoon Han et al. · Applied Physics Letters · 2003 · 66 citations

Natural Sciences, Materials Engineering, Materials Science +17

Highly transparent and conducting zinc oxide films deposited by activated reactive evaporation

W. S. Lau, Stephen J. Fonash · Journal of Electronic Materials · 1987 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +16

Stability of electrical properties of nitrogen-rich, silicon-rich, and stoichiometric silicon nitride films

W. S. Lau, Stephen J. Fonash, Jerzy Kanicki · Journal of Applied Physics · 1989 · 60 citations

Engineering, Materials Engineering, Materials Science +17

Evidence that N₂O is a Stronger Oxidizing Agent than O₂ for the Post-Deposition Annealing of Ta₂O₅ on Si Capacitors

W. S. Lau, Peng Wei Qian, Nathan P. Sandler et al. · Japanese Journal of Applied Physics · 1997 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +17