Japanese Journal of Applied Physics · 1991 · 41 citations · 7 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsSemiconductor Device MaterialsSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesSurface PassivationSurface PhysicsFermi LevelFermi Level PinningPassivation Of SemiconductorsPhotoluminescenceRecombination ProcessesSurface Current MeasurementSurface RecombinationSurface States
By a rigorous computer analysis of the surface recombination process, it is shown that the surface state distributions on semiconductor free surfaces can be determined from a measurement of the dependence of band-edge photoluminescence intensity on the excitation intensity. The measurement of the Fermi level pinning position in the dark by the surface current transport measurement avoids the possible ambiguity of the interpretation. The new technique is successfully applied to variously treated GaAs surfaces and to passivated InGaAs surfaces with and without the ultrathin Si interface control layer.
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Hideki Hasegawa, Hirotatsu Ishii, T. Sawada et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 86 citations
Natural Sciences, Materials Engineering, Materials Science +17