Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography

Critical issues in 157 nm lithography

T. M. Bloomstein, M. Rothschild, Rainer Kunz et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +17

An advanced epoxy novolac resist for fast high-resolution electron-beam lithography

Panagiotis Argitis, I. Raptis, Nikolaos Glezos et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 60 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +12

Outlook for 157-nm resist design

Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 47 citations

Natural Sciences, Materials Engineering, Materials Science +10

Direct fabrication of micro mesas by VUV laser ablation of polymers: PMMA (polymethylmethacrylate)

Markus Lapczyna, M. Stuke · Applied Physics A · 1998 · 37 citations

Engineering, Materials Engineering, Materials Science +12

New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists

M. Hatzakis, K Stewart, Jane M. Shaw et al. · Journal of The Electrochemical Society · 1991 · 27 citations

Engineering, Materials Engineering, Materials Science +15