High throughput defect detection with multiple parallel electron beams

H. M. P. van Himbergen, M. D. Nijkerk, P.W.H. de Jager, T. C. Hosman, P. Kruit

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 13 citations · 4 references

Concepts

Abstract

A new concept for high throughput defect detection with multiple parallel electron beams is described. As many as 30 000 beams can be placed on a footprint of a in.2, each beam having its own microcolumn and detection system without cross-talk. Based on the International Technology Roadmap for Semiconductors requirements, some high level properties of the implementation of this concept were derived. A projection lens was designed that can both focus the primary beam into a small spot and simultaneously collect 75% of the secondary electrons. Conceptual design studies were performed for three crucial components of the detector chain: the scintillator, the light optics, and the detection array. The throughput of this concept is expected to be at least a factor of 300 higher than standard electron beam based defect detection systems.

References

4