T. R. Groves

Maskless electron beam lithography: prospects, progress, and challenges

T. R. Groves, D. S. Pickard, B. Rafferty et al. · Microelectronic Engineering · 2002 · 91 citations

Electron-beam Lithography, Beam Lithography, Microscopy +2

Projection reduction exposure with variable axis immersion lenses: Next generation lithography

H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations

Engineering, Microscopy, Optic Design +18

Resist heating effects in 25 and 50 kV <i>e</i>-beam lithography on glass masks

E. Kratschmer, T. R. Groves · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 27 citations

Optical Materials, Engineering, Electron-beam Lithography +17

Distributed axis electron beam technology for maskless lithography and defect inspection

D. S. Pickard, T. R. Groves, W. D. Meisburger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 26 citations

Engineering, Electron-beam Lithography, Microscopy +22

Efficiency of electron-beam proximity effect correction

T. R. Groves · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 25 citations

Engineering, Electron-beam Lithography, Correction Method +21