S. D. Golladay

Projection reduction exposure with variable axis immersion lenses: Next generation lithography

H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations

Natural Sciences, Manufacturing Engineering, Biomedical Optics +11

PREVAIL—Electron projection technology approach for next-generation lithography

R. S. Dhaliwal, W. A. Enichen, S. D. Golladay et al. · IBM Journal of Research and Development · 2001 · 55 citations

Natural Sciences, Electrical Engineering, Physics +14

Electron-beam technology for open/short testing of multi-chip substrates

S. D. Golladay, Nikolaus Wagner, J. R. Rudert et al. · IBM Journal of Research and Development · 1990 · 31 citations

Engineering, Electrical Engineering, Microelectronics +10

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 17 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

PREVAIL Alpha system: Status and design considerations

S. D. Golladay, H. C. Pfeiffer, James Donald Rockrohr et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 14 citations

Natural Sciences, Electrical Engineering, Physics +15