H. C. Pfeiffer

Variable spot shaping for electron-beam lithography

H. C. Pfeiffer · Journal of Vacuum Science and Technology · 1978 · 105 citations

Engineering, Electron-beam Lithography, Microscopy +17

Recent advances in electron-beam lithography for the high-volume production of VLSI devices

H. C. Pfeiffer · IEEE Transactions on Electron Devices · 1979 · 98 citations

Engineering, Electron-beam Lithography, Microscopy +21

Projection reduction exposure with variable axis immersion lenses: Next generation lithography

H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations

Engineering, Microscopy, Optic Design +18

PREVAIL - An e-beam stepper with Variable Axis Immersion Lenses

H. C. Pfeiffer, W. Stickel · Microelectronic Engineering · 1995 · 55 citations

Geometrical Optic, E-beam Stepper, Beam Optic +1

PREVAIL—Electron projection technology approach for next-generation lithography

R. S. Dhaliwal, W. A. Enichen, S. D. Golladay et al. · IBM Journal of Research and Development · 2001 · 54 citations

Projection Level, Optical Materials, Engineering +15