Statistics
Publications
5
Citations
165
H-Index
5
Active since
1993
Affiliations
IBM (United States)(Current)
James Donald Rockrohr is an author at IBM (United States) specializing in optics, electron beam physics, and electron beam lithography.
Publications per year
1993–2001
5
5
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations
Natural Sciences, Manufacturing Engineering, Biomedical Optics +11
EL-4, a new generation electron-beam lithography system
H. C. Pfeiffer, Donald Edward Davis, W. A. Enichen et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 22 citations
Engineering, Manufacturing Engineering, Mechanical Engineering +17
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