Donor-acceptor pair formation in InP doped simultaneously with Si and Zn during metalorganic chemical vapor deposition

Abstract

Deposition of InP by metalorganic chemical vapor deposition, simultaneously doped with both a donor (Si) and an acceptor (Zn) species during the growth, has been carried out. The incorporation of Si is not affected by the presence of Zn, but the Zn incorporation is substantially enhanced by the presence of Si. These results are consistent with the formation of donor-acceptor pairs, which has been suggested earlier to explain Zn diffusion profiles in Si-doped InP.