Publication | Closed Access
Chemical Interactions Among Defects in Germanium and Silicon
487
Citations
25
References
1956
Year
SemiconductorsSolid SolutionsEngineeringPhysicsNatural SciencesIntrinsic ImpurityApplied PhysicsCondensed Matter PhysicsIon PairingAtomic PhysicsAcid-base NeutralizationSemiconductor MaterialDefect FormationChemistrySilicon On InsulatorDefect ToleranceChemical InteractionsGermanene
Solid solutions in germanium and silicon resemble aqueous solutions, serving as media for chemical reactions that aid in studying semiconductor properties. The study examines acid‑base neutralization, complex ion formation, and ion pairing in these solid solutions, combining theory and experiment to describe recent developments. The study investigates interactions among defects in germanium and silicon.
Interactions among defects in germanium and silicon have been investigated. The solid solutions involved bear a strong resemblance to aqueous solutions insofar as they represent media for chemical reactions. Such phenomena as acid-base neutralization, complex ion formation, and ion pairing, all take place. These phenomena, besides being of interest in themselves, are useful in studying the properties of the semiconductors in which they occur. The following article is a blend of theory and experiment, and describes developments in this field during the past few years.
| Year | Citations | |
|---|---|---|
1952 | 6.3K | |
1949 | 2.1K | |
1951 | 1.2K | |
1954 | 998 | |
1957 | 536 | |
1951 | 335 | |
1954 | 315 | |
1953 | 314 | |
1954 | 302 | |
1934 | 207 |
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