F. R. Shepherd - Concepedia

Author

F. R. Shepherd

Also Known As

F R Shepherd, F. R. Shepherd, F. Shepherd, F.R Shepherd, F.R. Shepherd, Frank R Shepherd, Frank R. Shepherd, Frank Shepherd

103

Publications

2.1K

Citations

H-Index

Concepts

All Affiliations

Nortel (Canada)Bell (Canada)Western University University of British Columbia Imperial College London

About

F. R. Shepherd is an author at Nortel (Canada) specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	21	40	1.8K
2	Applied Physics	19	34	1.6K
3	Natural Sciences	5	5	305
4	Education	1	1	34
5	Health Sciences	1	1	34

F. R. Shepherd

Publications

Citations

H-Index

Page 1

	Year	Citations
Conductivity behavior in polycrystalline semiconductor thin film transistors J. Levinson, F. R. Shepherd, P. J. Scanlon, Journal of Applied Physics Materials ScienceDevice ModelingElectrical EngineeringSemiconductorsEngineering	1982	612
Photoemission studies of the band structures of transition metal dichalcogenides. I. Groups IVA and IVB F. R. Shepherd, Philip M. Williams Journal of Physics C Solid State Physics Ii-vi SemiconductorTransition Metal ChalcogenidesPhotoemission StudiesEngineeringPhysics	1974	95
Structural determinations of the Rh(100) and Cu(111) surfaces using the reliability factor proposed for LEED by Zanazzi and Jona P.R. Watson, F. R. Shepherd, D.C. Frost, Surface Science Materials ScienceSurface CharacterizationReliability FactorEngineeringCorrosion	1978	82
He II photoemission studies of transition metal dichalcogenides Philip M. Williams, F. R. Shepherd Journal of Physics C Solid State Physics Ii-vi SemiconductorTransition Metal ChalcogenidesValence Band DensitiesEngineeringPhotochemistry	1973	73
10 Gbit/s, 1.56 μm multiquantum well InP/InGaAsP Mach–Zehnder optical modulator C. Rolland, F. R. Shepherd, G. Hillier Electronics Letters	1993	71
Characteristics of dc magnetron, reactively sputtered TiN<i>x</i> films for diffusion barriers in III–V semiconductor metallization J. P. Noël, D. C. Houghton, G. Este, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Crystal StructureMagnetic PropertiesEngineeringSolid-state ChemistryThin Film Process Technology	1984	66
Secondary ion mass spectrometry and electrical characterization of Zn diffusion in <i>n</i>-type InP C. Blaauw, F. R. Shepherd Journal of Applied Physics Spacer LayersEngineeringZn Diffusion ProfilesChemistryChemical Deposition	1989	60
Photoemission studies of the band structures of transition metal dichalcogenides. II. Groups VA and VIA F. R. Shepherd, Philip M. Williams Journal of Physics C Solid State Physics EngineeringCharge Density WavesTransition Metal DichalcogenidesGroups VaChemistry	1974	57
Secondary ion mass spectrometry profiling of shallow, implanted layers using quadrupole and magnetic sector instruments Wilfried Vandervorst, F. R. Shepherd Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringBiological Mass SpectrometryIon Beam InstrumentationBiomedical EngineeringChemistry	1987	55
Surface transient behavior of the 30Si+ yield with angle of incidence and energy of an O+2 primary beam Wilfried Vandervorst, F. R. Shepherd, J. H. Newman, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringIon Beam InstrumentationBeam OpticIon ImplantationRadiation Generation	1985	41

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