Review of the wafer stage for nanoimprint lithography

Imprint of sub-25 nm vias and trenches in polymers

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations

Engineering, Manufacturing Engineering, Materials Science +15

Sub-10 nm imprint lithography and applications

Stephen Y. Chou, Peter R. Krauss, Wei Zhang et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 1.1K citations

Engineering, Electrical Engineering, Materials Science +14

Recent progress in nanoimprint technology and its applications

L. Jay Guo · Journal of Physics D Applied Physics · 2004 · 726 citations · Full text

Engineering, Materials Engineering, Materials Science +12

Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen C. Johnson, M. D. Stewart et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 564 citations

Engineering, Materials Engineering, Materials Science +16

Imprint lithography with sub-10 nm feature size and high throughput

Stephen Y. Chou, Peter R. Krauss · Microelectronic Engineering · 1997 · 373 citations

Engineering, Materials Engineering, Materials Science +13