Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 13 citations · 4 references
EngineeringMaterials EngineeringMaterials ScienceMicrofabricationSurface EngineeringSurface ScienceEtching ProcessesMems ModelingMems SimulationMicrofabrication MaterialsMicrofabrication ProcessesSurface ModificationChemical EtchingEtch MechanismsEtch Rate ModelingEtchingHf Release EtchingRelease EtchingSacrificial Layer EtchingSurface Etching
A release etch model for etching sacrificial oxides in aqueous HF solutions is presented. This model is an extension of work done by Monk et. al. and Liu et. al The model is inherently one dimensional, but can be used to model the etching of complex three dimensional parts. Solutions and boundary conditions are presented for a number of geometries.
4