Concepedia

Sacrificial Layer Etching

Sacrificial Layer Etching is a micromachining technique in which a transient structural layer is selectively removed through chemical or plasma etching to enable the release and mobility of overlying microfabricated components in surface micromachined MEMS devices.

150

Publications

5.3K

Citations

625

Authors

187

Institutions

Publications per year

2017–2026

12

Parents

Publications

150

Fabrication of single-crystal lithium niobate films by crystal ion slicing

M. Levy, Richard M. Osgood, R. Liu et al. · Applied Physics Letters · 1998 · 347 citations

, , +17

Water and Blood Repellent Flexible Tubes

Sasha Hoshian, Esko Kankuri, Robin H. A. Ras et al. · Scientific Reports · 2017 · 221 citations · Full text

, , +13

Recent advances in silicon etching for MEMS using the ASE™ process

A. Hynes, Hamza Ashraf, Jy Bhardwaj et al. · Sensors and Actuators A Physical · 1999 · 178 citations

, , +14

Silicon dioxide sacrificial layer etching in surface micromachining

Johannes Bühler, F-P Steiner, H. Baltes · Journal of Micromechanics and Microengineering · 1997 · 172 citations

, , +17

A new technique for fabricating three-dimensional micro- and nanostructures of various shapes

V. Ya. Prinz, Detlev Grützmacher, André Beyer et al. · Nanotechnology · 2001 · 127 citations

, , +17

1–5 of 150

Authors

625

  1. RT
    Roger T. Howe

    University of California, Berkeley, United States

    4 publications · 147 citations

    4

    h-index

  2. AV
    Albert van den Berg

    University of Twente, Netherlands

    4 publications · 199 citations

    4

    h-index

  3. AK
    Abhishek Kumar

    Motilal Nehru National Institute of Technology, India

    3 publications · 416 citations

    3

    h-index

  4. WO
    Wouter Olthuis

    University of Twente, Netherlands

    3 publications · 161 citations

    3

    h-index

  5. DJ
    David J. Monk

    Motorola (United States), United States

    3 publications · 105 citations

    3

    h-index

1–5 of 625

Institutions

187

  1. University of Twente

    Enschede, The Netherlands

    8 h-index

    30 publications

    1.6K citations

  2. KTH Royal Institute of Technology

    Stockholm, Sweden

    5 h-index

    13 publications

    530 citations

  3. Centro Nacional de Microelectrónica

    Barcelona, Spain

    5 h-index

    10 publications

    227 citations

  4. University of California, Berkeley

    Berkeley, United States

    4 h-index

    10 publications

    378 citations

  5. Chalmers University of Technology

    Gothenburg, Sweden

    4 h-index

    16 publications

    513 citations

  6. ETH Zurich

    Zurich, Switzerland

    4 h-index

    7 publications

    658 citations

  7. National Chung Hsing University

    Taichung, Taiwan

    3 h-index

    6 publications

    118 citations

  8. Brigham Young University

    Provo, United States

    3 h-index

    12 publications

    368 citations

1–8 of 187

Venues

  1. Journal of Micromechanics and Microengineering

    JMM · 24 publications · 1K citations

    18

    h-index

  2. Sensors and Actuators A Physical

    10 publications · 449 citations

    10

    h-index

  3. Microelectronic Engineering

    10 publications · 281 citations

    9

    h-index

  4. Applied Physics Letters

    9 publications · 682 citations

    9

    h-index

  5. Journal of Microelectromechanical Systems

    8 publications · 286 citations

    8

    h-index

1–5