Release Etching

Release Etching is a micromachining process in surface micromachining that selectively removes a sacrificial layer to free a suspended microstructure, thereby enabling its mechanical mobility within a MEMS device.

12

Publications

461

Citations

37

Authors

16

Institutions

Publications per year

2017–2026

0

Authors

37

  1. DF
    Daniel Fernández

    Universitat Politècnica de Catalunya, Spain

    1 publications · 16 citations

    1

    h-index

  2. SF
    Sami Franssila

    Aalto University, Finland

    1 publications · 120 citations

    1

    h-index

  3. RL
    Robert L. Alley

    University of California, Berkeley, United States

    1 publications · 142 citations

    1

    h-index

  4. ST
    Santeri Tuomikoski

    University of Helsinki, Finland

    1 publications · 120 citations

    1

    h-index

  5. CH
    C. Hibert

    École Polytechnique Fédérale de Lausanne, Switzerland

    1 publications · 40 citations

    1

    h-index

1–5 of 37

Venues

  1. Sensors and Actuators A Physical

    3 publications · 149 citations

    3

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 1 publications · 12 citations

    1

    h-index

  3. 1

    h-index

  4. Journal of Microelectromechanical Systems

    1 publications · 16 citations

    1

    h-index

  5. Small

    1 publications · 12 citations

    1

    h-index

1–5