Release Etching
Release Etching is a micromachining process in surface micromachining that selectively removes a sacrificial layer to free a suspended microstructure, thereby enabling its mechanical mobility within a MEMS device.
12
Publications
461
Citations
37
Authors
16
Institutions
Publications per year
2017–2026
0
12
The effect of release-etch processing on surface microstructure stiction
Robert L. Alley, G.J. Cuan, Roger T. Howe et al. · 2003 · 142 citations
Silicon sacrificial layer dry etching (SSLDE) for free-standing RF MEMS architectures
S. Frederico, C. Hibert, R. Fritschi et al. · 2003 · 40 citations · Full text
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16
National University of Singapore
Singapore, Singapore
2 h-index
5 publications
142 citations
Agency for Science, Technology and Research
Singapore, Singapore
1 h-index
3 publications
36 citations
Korea Electronics Technology Institute
Seongnam-si, South Korea
1 h-index
2 publications
34 citations
École Polytechnique Fédérale de Lausanne
Lausanne, Switzerland
1 h-index
6 publications
240 citations
University of California, Berkeley
Berkeley, United States
1 h-index
4 publications
568 citations
Nanyang Technological University
Singapore, Singapore
1 h-index
1 publications
12 citations
Sandia National Laboratories California
Livermore, United States
1 h-index
3 publications
39 citations
Ascamm Technologic Center
Cerdanyola del Vallès, Spain
1 h-index
1 publications
16 citations
1–8 of 16
3 publications · 149 citations
3
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JMM · 1 publications · 12 citations
1
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1 publications · 13 citations
1
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1 publications · 16 citations
1
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1 publications · 12 citations
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