Concepedia

Etching characteristics and mechanism of Pb(Zr,Ti)O3 thin films in CF4/Ar inductively coupled plasma

Alexander Efremov, D.P Kim, K.T Kim, C.I Kim

Vacuum · 2004 · 18 citations · 28 references

DOI

Concepts

References

28

Handbook of chemistry and physics

Journal of the Franklin Institute · 1930 · 11.7K citations

, , +8

Global model of Ar, O2, Cl2, and Ar/O2 high-density plasma discharges

Chae-Jin Lee, M. A. Lieberman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 550 citations

, , +17

Surface science aspects of etching reactions

Harold F. Winters, J. W. Coburn · Surface Science Reports · 1992 · 496 citations

, , +12

Phenomenological modeling of ion-enhanced surface kinetics in fluorine-based plasma etching

David C. Gray, I. Tepermeister, Herbert H. Sawin · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 255 citations

, , +17

Global models of pulse-power-modulated high-density, low-pressure discharges

M. A. Lieberman, S. Ashida · Plasma Sources Science and Technology · 1996 · 250 citations

, , +14