Alexander Efremov - Concepedia

Author

Alexander Efremov

Ivanovo State University of Chemistry and Technology ORCID

Also Known As

A. Efremov, A. M. Efremov, A.M Efremov, A.M. Efremov, Alexander Efremov, Alexander M. Efremov, Efremov, Alexander, А. М. Ефремов

198

Publications

2.4K

Citations

H-Index

Concepts

All Affiliations

Ivanovo State University of Chemistry and Technology Korea University Chung-Ang University Corning (United States)Hanseo University

About

Alexander Efremov is an author at Ivanovo State University of Chemistry and Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	23	60	1.6K
2	Applied Physics	20	43	1.1K
3	Chemical Engineering	13	16	322
4	Chemistry	12	13	334
5	Natural Sciences	2	2	90

Alexander Efremov

Publications

Citations

H-Index

Page 1

	Year	Citations
Simple Model for Ion-Assisted Etching Using&lt;tex&gt;$hboxCl_2hbox--hboxAr$&lt;/tex&gt;Inductively Coupled Plasma: Effect of Gas Mixing Ratio Alexander Efremov, Daewon Kim, C.-I. Kim IEEE Transactions on Plasma Science EngineeringSimple ModelIon-assisted Etching UsingPlasma PhysicsPlasma Processing	2004	101
A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications Inwoo Chun, Alexander Efremov, Geun Young Yeom, Thin Solid Films Materials ScienceEngineeringApplied PhysicsC4f8/o2/ar PlasmasDry Etching Applications	2015	93
Connecting the macro- and microstrain responses in technical porous ceramics: modeling and experimental validations Giovanni Bruno, Alexander Efremov, Andreyi N. Levandovskyi, Journal of Materials Science	2010	87
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl[sub 2]∕X (X=Ar, He, N[sub 2]) Inductively Coupled Plasmas Alexander Efremov, Nam‐Ki Min, Bok‐Gil Choi, Journal of The Electrochemical Society EngineeringModel-based AnalysisLangmuir ProbesPlasma SciencePlasma Physics	2008	64
On the stress-free lattice expansion of porous cordierite Giovanni Bruno, Alexander Efremov, B. Clausen, Acta Materialia Materials SciencePore StructureEngineeringApplied PhysicsPorosity	2010	59
On the applicability of self-consistent global model for the characterization of Cl2/Ar inductively coupled plasma Alexander Efremov, Gwan-Ha Kim, Jong‐Gyu Kim, Microelectronic Engineering EngineeringSelf-consistent Global ModelPhysicsPlasma TheoryApplied Physics	2006	53
On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma Mansu Kim, Nam‐Ki Min, Sun Jin Yun, Microelectronic Engineering Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringSurface Science	2007	52
On the Control of Plasma Parameters and Active Species Kinetics in CF4 + O2 + Ar Gas Mixture by CF4/O2 and O2/Ar Mixing Ratios Alexander Efremov, Junmyung Lee, Jihun Kim Plasma Chemistry and Plasma Processing O2/ar Mixing RatiosChemical EngineeringPlasma ParametersEngineeringGas Dynamic	2017	47
A Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N[sub 2]) Inductively Coupled Plasmas Kwang‐Ho Kwon, Alexander Efremov, Moonkeun Kim, Journal of The Electrochemical Society Plasma ParametersPlasma ModelEngineeringPhysicsModel-based Analysis	2010	45
Inductively coupled Cl2/Ar plasma: Experimental investigation and modeling Alexander Efremov, Dong‐Pyo Kim, Chang-Il Kim Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Cl2/ar PlasmaEngineeringPhysicsChlorine AtomsPlasma Simulation	2003	43

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