Publication | Closed Access
A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications
93
Citations
25
References
2015
Year
Materials ScienceEngineeringApplied PhysicsC4f8/o2/ar PlasmasDry Etching ApplicationsGas Discharge PlasmaPlasma ApplicationPlasma EtchingComparative StudyPlasma Processing
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