Kwang‐Ho Kwon

Effects of O2 plasma treatment on NH3 sensing characteristics of multiwall carbon nanotube/polyaniline composite films

Kum-Pyo Yoo, Kwang‐Ho Kwon, Nam‐Ki Min et al. · Sensors and Actuators B Chemical · 2009 · 124 citations

Materials Science, Chemical Engineering, Engineering +3

A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications

Inwoo Chun, Alexander Efremov, Geun Young Yeom et al. · Thin Solid Films · 2015 · 93 citations

Materials Science, Engineering, Applied Physics +7

Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl[sub 2]∕X (X=Ar, He, N[sub 2]) Inductively Coupled Plasmas

Alexander Efremov, Nam‐Ki Min, Bok‐Gil Choi et al. · Journal of The Electrochemical Society · 2008 · 64 citations

Engineering, Model-based Analysis, Langmuir Probes +17

High mobility ultra-thin crystalline indium oxide thin film transistor using atomic layer deposition

Jong-Chan Lee, Jaehyun Moon, Jae‐Eun Pi et al. · Applied Physics Letters · 2018 · 64 citations

Engineering, Thin Film Process Technology, Nanoelectronics +17

On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma

Mansu Kim, Nam‐Ki Min, Sun Jin Yun et al. · Microelectronic Engineering · 2007 · 52 citations

Materials Engineering, Materials Science, Electrical Engineering +11