Publication | Closed Access
On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma
52
Citations
34
References
2007
Year
Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringSurface ScienceApplied PhysicsBcl3/ar PlasmaThin FilmsGas Discharge PlasmaMicroelectronicsPlasma EtchingPlasma ProcessingPlasma ApplicationZro2 Thin Films
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