Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses

Fundamental understanding and modeling of reactive sputtering processes

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Control of reactive sputtering processes

W.D. Sproul, D.J. Christie, D.C. Carter · Thin Solid Films · 2005 · 395 citations

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Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

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High rate reactive sputtering process control

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Preparation of magnetron sputtered TiNxOy thin films

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