Control of reactive sputtering processes

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1K citations

Electrical Engineering, Engineering, Magnetron Sputter Technique +3

Handbook of thin film process technology

W Steckelmacher · Vacuum · 1996 · 284 citations

Materials Science, Surface Technology, Thin Film Physics +10

Gas density reduction effects in magnetrons

S. M. Rossnagel · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 272 citations

Engineering, Plasma Science, Plasma Physics +19

High power pulsed magnetron sputtered CrN films

Arutiun P. Ehiasarian, W.‐D. Münz, Lars Hultman et al. · Surface and Coatings Technology · 2002 · 271 citations

Materials Engineering, Engineering, Applied Physics +4

Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

K. Macák, V. Kouznetsov, Jochen M. Schneider et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 270 citations

High Plasma Density, Engineering, Magnetron Discharge +21