K. Macák - Concepedia

Concepedia

Author

K. Macák

Linköping University

Also Known As

K Macák, K. Macak, K. Macák, Karol Macak, Karol Macàk, Karol Macák, Macak, K. A.

23

Publications

1.7K

Citations

11

H-Index

52

Concepts

All Affiliations

Linköping University University of Illinois Urbana-Champaign Uppsala University Nagoya Industrial Science Research Institute

KM

About

K. Macák is an author at Linköping University specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	13	1.7K
2	Applied Physics	11	13	1.7K
3	Materials Engineering	5	5	136
4	Natural Sciences	4	4	318
5	Electrical Engineering	1	1	1K

K. Macák

×

13

Publications

1.7K

Citations

11

H-Index

	Year	Citations
A novel pulsed magnetron sputter technique utilizing very high target power densities V. Kouznetsov, K. Macák, Jochen M. Schneider, Surface and Coatings Technology Electrical EngineeringEngineeringMagnetron Sputter TechniqueTarget FabricationApplied Physics	1999	1K
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge K. Macák, V. Kouznetsov, Jochen M. Schneider, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films High Plasma DensityEngineeringMagnetron DischargePlasma Probe MeasurementsGlow Discharge	2000	270
Hydrogen uptake in alumina thin films synthesized from an aluminum plasma stream in an oxygen ambient Jochen M. Schneider, André Anders, Bjørgvin Hjörvarsson, Applied Physics Letters Materials ScienceAluminium NitrideEngineeringPlasma ProcessingAlumina Thin Films	1999	80
Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films Niklas Hellgren, K. Macák, Esteban Broitman, Journal of Applied Physics Cnx Thin FilmsEngineeringLangmuir ProbesGraphite TargetMagnetism	2000	79
High rate reactive dc magnetron sputter deposition of Al2O3 films Maryam Olsson, K. Macák, Ulf Helmersson, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceMagnetismMaterials EngineeringOptical MaterialsSufficient Ar Pressure	1998	43
Epitaxial growth of W-doped VO2/V2O3 multilayer on α-Al2O3(110) by reactive magnetron sputtering Ping Jin, Masato Tazawa, Kazuyoshi Yoshimura, Thin Solid Films Materials ScienceOxide HeterostructuresMaterials EngineeringW-doped Vo2/v2o3 MultilayerEngineering	2000	35
Growth and characterization of epitaxial films of tungsten-doped vanadium oxides on sapphire (110) by reactive magnetron sputtering Ping Jin, Masato Tazawa, M. Ikeyama, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceOxide HeterostructuresMaterials EngineeringTriple-domain StructureW-doped Vanadium Oxides	1999	28
Encoding of stoichiometric constraints in the composition depth profile reconstruction from angle resolved X‐ray photoelectron spectroscopy data K. Macák Surface and Interface Analysis X-ray CrystallographyX-ray SpectroscopyEngineeringComputational ChemistryX-ray Imaging	2011	22
Monte Carlo simulations of the transport of sputtered particles K. Macák, Peter Macák, Ulf Helmersson Computer Physics Communications EngineeringPhysicsMonte CarloFluid MechanicsApplied Physics	1999	21
Reactive d.c. magnetron sputter deposited Al2O3 films: large-area coatings for industrial applications Maryam Olsson, K. Macák, Wolfgang Graf Surface and Coatings Technology Materials ScienceMaterials EngineeringIndustrial ApplicationsEngineeringCorrosion	1999	20

Page 1