Publication | Closed Access
Hydrogen uptake in alumina thin films synthesized from an aluminum plasma stream in an oxygen ambient
80
Citations
10
References
1999
Year
Materials ScienceAluminium NitrideEngineeringPlasma ProcessingAlumina Thin FilmsSurface ScienceApplied PhysicsAluminum Plasma StreamVacuum DeviceHydrogenThin FilmsHydrogen UptakeGas Discharge PlasmaAlumina FilmsChemical Vapor DepositionElectrochemistryAnodizing
We describe the hydrogen uptake during the synthesis of alumina films from H2O present in the high vacuum gas background. The hydrogen concentration in the films was determined by the H1(N15,αγ)C12 nuclear resonance reaction. Furthermore, we show the presence of hydrogen ions in the plasma stream by time-of-flight mass spectrometry. The hydrogen content increased in both the film and the plasma stream, as the oxygen partial pressure was increased. On the basis of these measurements and thermodynamic considerations, we suggest that an aluminum oxide hydroxide compound is formed, both on the cathode surface as well as in the film. The large scatter in the data reported in the literature for refractive index and chemical stability of alumina thin films can be explained on the basis of the suggested aluminum oxide hydroxide formation.
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