Reactive Sputtering
Reactive Sputtering is a thin-film deposition technique within physical vapor deposition wherein a target material is sputtered in the presence of a reactive gas that chemically interacts with the sputtered species to form a compound film on the substrate.
2.4K
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101.3K
Citations
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1.4K
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Publications per year
2017–2026
297
Parents
2.4K
Reproducible resistance switching in polycrystalline NiO films
Sunae Seo, Myoung‐Jae Lee, David H. Seo et al. · Applied Physics Letters · 2004 · 934 citations
Natural Sciences, Materials Engineering, Materials Science +16
Reactive-sputter-deposited TiN films on glass substrates
Joshua Pelleg, Levy Zevin, S. Lungo et al. · Thin Solid Films · 1991 · 744 citations
Natural Sciences, Materials Engineering, Materials Science +14
Optical band gap of indium nitride
T.L. Tansley, C. P. Foley · Journal of Applied Physics · 1986 · 606 citations
Natural Sciences, Materials Engineering, Materials Science +17
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Linköping University
Linköping, Sweden
36 h-index
270 publications
15.7K citations

Centre National de la Recherche Scientifique
Paris, France
35 h-index
450 publications
15.5K citations

Uppsala University
Uppsala, Sweden
33 h-index
211 publications
11.7K citations

Chinese Academy of Sciences
Beijing, China
28 h-index
169 publications
9.1K citations

Ghent University
Ghent, Belgium
25 h-index
107 publications
5K citations
Thinfilm (Sweden)
Linköping, Sweden
24 h-index
146 publications
7.6K citations
University of West Bohemia in Pilsen
Pilsen, Czechia
23 h-index
97 publications
6K citations
École Polytechnique Fédérale de Lausanne
Lausanne, Switzerland
22 h-index
86 publications
4.9K citations
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300 publications · 15.4K citations
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230 publications · 13K citations
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205 publications · 9.5K citations
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133 publications · 8.4K citations
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166 publications · 7.3K citations
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