Reactive Sputtering

Reactive Sputtering is a thin-film deposition technique within physical vapor deposition wherein a target material is sputtered in the presence of a reactive gas that chemically interacts with the sputtered species to form a compound film on the substrate.

2.4K

Publications

101.3K

Citations

7.2K

Authors

1.4K

Institutions

Publications per year

2017–2026

297

Authors

7.2K

  1. DD
    Diederik Depla

    Ghent University, Belgium

    37 publications · 1.7K citations

    25

    h-index

  2. SB
    S. Berg

    Uppsala University, Sweden

    28 publications · 1.4K citations

    20

    h-index

  3. LH
    Lars Hultman

    Linköping University, Sweden

    30 publications · 1.8K citations

    20

    h-index

  4. TN
    Tomas Nyberg

    Uppsala University, Sweden

    25 publications · 1.5K citations

    19

    h-index

  5. JM
    J. Musil

    University of West Bohemia in Pilsen, Czechia

    19 publications · 1.7K citations

    17

    h-index

1–5 of 7.2K

Venues

  1. Thin Solid Films

    300 publications · 15.4K citations

    61

    h-index

  2. Journal of Applied Physics

    230 publications · 13K citations

    60

    h-index

  3. Surface and Coatings Technology

    205 publications · 9.5K citations

    54

    h-index

  4. Applied Physics Letters

    133 publications · 8.4K citations

    53

    h-index

  5. 47

    h-index

1–5