Arutiun P. Ehiasarian

High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

André Anders, Joakim Andersson, Arutiun P. Ehiasarian · Journal of Applied Physics · 2007 · 340 citations · Full text

Materials Engineering, Electrical Engineering, Engineering +12

The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

Johan Böhlmark, Martina Lattemann, Arutiun P. Ehiasarian et al. · Thin Solid Films · 2006 · 316 citations

Electrical Engineering, Ion Energy Distributions, Physics +5

Influence of high power densities on the composition of pulsed magnetron plasmas

Arutiun P. Ehiasarian, R. New, W.‐D. Münz et al. · Vacuum · 2002 · 297 citations

Magnetism, Electrical Engineering, Engineering +6

Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion

Arutiun P. Ehiasarian, Jianguo Wen, I. Petrov · Journal of Applied Physics · 2007 · 294 citations

Engineering, Excellent Adhesion, Glow Discharge +25

High power pulsed magnetron sputtered CrN films

Arutiun P. Ehiasarian, W.‐D. Münz, Lars Hultman et al. · Surface and Coatings Technology · 2002 · 271 citations

Materials Engineering, Engineering, Applied Physics +4