Influence of high power densities on the composition of pulsed magnetron plasmas

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1.1K citations

Natural Sciences, Materials Science, Physics +7

Metal ion deposition from ionized mangetron sputtering discharge

S. M. Rossnagel, Jeffrey Hopwood · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 307 citations

Natural Sciences, Materials Engineering, Materials Science +17

Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

K. Macák, V. Kouznetsov, Jochen M. Schneider et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 275 citations

Natural Sciences, Materials Science, Physics +17

Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure

I. Petrov, Lars Hultman, J.‐E. Sundgren et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 238 citations

Natural Sciences, Materials Engineering, Materials Science +15

Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures

I. Petrov, Alan Myers, J. E. Greene et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 195 citations

Natural Sciences, Materials Engineering, Materials Science +14