Concepedia

Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

Nicolas Martin, O. Banakh, Ana Maria do Espírito Santo, Simon Springer, R. Sanjinés, J. Takadoum, F. Lévy

Applied Surface Science · 2001 · 130 citations · 29 references

DOI

Concepts

References

29

Zero-bias resistance of grain boundaries in neutron-transmutation-doped polycrystalline silicon

C. H. Seager, T. G. Castner · Journal of Applied Physics · 1978 · 270 citations

, , +17

Optical properties of zinc oxynitride thin films

Masanobu Futsuhara, Katsuaki Yoshioka, Osamu Takai · Thin Solid Films · 1998 · 208 citations

, , +14

Partial pressure control of reactively sputtered titanium nitride

A. F. Hmiel · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 83 citations

, , +13

Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique

Nicolas Martin, R. Sanjinés, J. Takadoum et al. · Surface and Coatings Technology · 2001 · 77 citations

, , +13

Optical and electronic properties of sputtered TiNx thin films

P. E. Schmid, Masako Sato Sunaga, F. Lévy · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 74 citations

, , +17