J.M. Chappé

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

J.M. Chappé, Nicolas Martin, Jan Lintymer et al. · Applied Surface Science · 2007 · 111 citations

Materials Science, Engineering, Surface Science +5

Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films

P. Carvalho, J.M. Chappé, L. Cunha et al. · Journal of Applied Physics · 2008 · 81 citations · Full text

Optical Materials, Engineering, Reactive Gas Flow +17

Influence of zigzag microstructure on mechanical and electrical properties of chromium multilayered thin films

Jan Lintymer, Nicolas Martin, J.M. Chappé et al. · Surface and Coatings Technology · 2003 · 68 citations

Materials Science, Material Analysis, Engineering +9

Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering

J.M. Chappé, Nicolas Martin, G. Terwagne et al. · Thin Solid Films · 2003 · 62 citations

Materials Science, Materials Engineering, Chemical Engineering +9

Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

J.M. Chappé, Nicolas Martin, J.F. Pierson et al. · Applied Surface Science · 2004 · 58 citations

Materials Engineering, Materials Science, Material Analysis +9