G. Terwagne

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

J.M. Chappé, Nicolas Martin, Jan Lintymer et al. · Applied Surface Science · 2007 · 111 citations

Materials Science, Engineering, Surface Science +5

Colour control of titanium nitride coatings produced by reactive magnetron sputtering at temperature less than 100°C

Ph. Roquiny, F. Bodart, G. Terwagne · Surface and Coatings Technology · 1999 · 78 citations

Materials Science, Materials Engineering, Titanium Nitride Coatings +8

Study of ZrN layers deposited by reactive magnetron sputtering

M. Re, R. Gouttebaron, J. P. Dauchot et al. · Surface and Coatings Technology · 2003 · 75 citations

Materials Science, Magnetism, Materials Engineering +5

Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering

J.M. Chappé, Nicolas Martin, G. Terwagne et al. · Thin Solid Films · 2003 · 62 citations

Materials Science, Materials Engineering, Chemical Engineering +9

Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

J.M. Chappé, Nicolas Martin, J.F. Pierson et al. · Applied Surface Science · 2004 · 58 citations

Materials Engineering, Materials Science, Material Analysis +9