Sputter Deposition

Sputter Deposition is a thin-film deposition technique in which atoms are dislodged from a solid target material by energetic ion bombardment and subsequently deposited as a thin film onto a substrate, distinguishing it from other deposition methods by its reliance on physical sputtering rather than chemical reaction or thermal evaporation.

5.9K

Publications

235.5K

Citations

17K

Authors

2.5K

Institutions

Publications per year

2017–2026

712

Authors

17K

  1. LH
    Lars Hultman

    Linköping University, Sweden

    52 publications · 4.1K citations

    34

    h-index

  2. IP
    I. Petrov

    University of Illinois Urbana-Champaign, United States

    53 publications · 5.6K citations

    31

    h-index

  3. JM
    J. Musil

    University of West Bohemia in Pilsen, Czechia

    37 publications · 2.3K citations

    25

    h-index

  4. DD
    Diederik Depla

    Ghent University, Belgium

    41 publications · 2.3K citations

    24

    h-index

  5. JV
    J. Vlček

    University of West Bohemia in Pilsen, Czechia

    27 publications · 1.7K citations

    22

    h-index

1–5 of 17K

Venues

  1. Thin Solid Films

    695 publications · 29.2K citations

    82

    h-index

  2. Journal of Applied Physics

    427 publications · 21.1K citations

    74

    h-index

  3. 67

    h-index

  4. Applied Physics Letters

    265 publications · 14.4K citations

    63

    h-index

  5. Surface and Coatings Technology

    462 publications · 18.2K citations

    62

    h-index

1–5