Concepedia

Sputtering Techniques

Sputtering Techniques is a physical vapor deposition method that involves the bombardment of a target material with high-energy ions to eject atoms, which subsequently condense on a substrate to form thin films, distinguished from other deposition techniques by its use of momentum transfer in a plasma environment for precise, high-purity coating of transparent conducting oxides.

2.8K

Publications

102.6K

Citations

8.6K

Authors

1.7K

Institutions

Publications per year

2017–2026

309

Parents

Publications

2.8K

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1.1K citations

, , +7

Reproducible resistance switching in polycrystalline NiO films

Sunae Seo, Myoung‐Jae Lee, David H. Seo et al. · Applied Physics Letters · 2004 · 934 citations

, , +16

Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties

K. Ellmer · Journal of Physics D Applied Physics · 2000 · 590 citations

, , +17

<i>Glow Discharge Processes: Sputtering and Plasma Etching</i>

B. N. Chapman, J. L. Vossen · Physics Today · 1981 · 544 citations

, , +16

Selective Sputtering and Atomic Resolution Imaging of Atomically Thin Boron Nitride Membranes

Jannik C. Meyer, Andrey Chuvilin, Gerardo Algara‐Siller et al. · Nano Letters · 2009 · 540 citations

, , +17

1–5 of 2.8K

Authors

8.6K

  1. DD
    Diederik Depla

    Ghent University, Belgium

    21 publications · 1.4K citations

    17

    h-index

  2. PK
    Peter Kelly

    Manchester Metropolitan University, United Kingdom

    16 publications · 988 citations

    16

    h-index

  3. NM
    Nicolas Martin

    Centre National de la Recherche Scientifique, France

    17 publications · 887 citations

    15

    h-index

  4. WE
    W. Eckstein

    Max Planck Institute for Plasma Physics, Germany

    14 publications · 711 citations

    14

    h-index

  5. MN
    M. Naoe

    Tokyo Institute of Technology, Japan

    17 publications · 604 citations

    14

    h-index

1–5 of 8.6K

Institutions

1.7K

  1. Centre National de la Recherche Scientifique

    Paris, France

    31 h-index

    338 publications

    10.5K citations

  2. IBM (United States)

    Armonk, United States

    27 h-index

    83 publications

    5.3K citations

  3. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    26 h-index

    88 publications

    6.2K citations

  4. Chinese Academy of Sciences

    Beijing, China

    23 h-index

    127 publications

    9.1K citations

  5. Linköping University

    Linköping, Sweden

    23 h-index

    130 publications

    13.8K citations

  6. University of Illinois Urbana-Champaign

    Urbana, United States

    21 h-index

    82 publications

    5.1K citations

  7. Max Planck Institute for Plasma Physics

    Garching, Germany

    21 h-index

    98 publications

    3.3K citations

  8. Max Planck Society

    Munich, Germany

    21 h-index

    62 publications

    2.7K citations

1–8 of 1.7K

Venues

  1. Thin Solid Films

    334 publications · 13.2K citations

    57

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  2. Surface and Coatings Technology

    254 publications · 11.1K citations

    52

    h-index

  3. Journal of Applied Physics

    108 publications · 5.7K citations

    42

    h-index

  4. 37

    h-index

  5. Applied Surface Science

    105 publications · 3.8K citations

    34

    h-index

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