Study on ta diffusion barrier in Al/Si system

Barrier layers: Principles and applications in microelectronics

M. Wittmer · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 202 citations

Engineering, Materials Engineering, Materials Science +17

Phase equilibria in metal-gallium-arsenic systems: Thermodynamic considerations for metallization materials

R. Beyers, Ki Bum Kim, Robert Sinclair · Journal of Applied Physics · 1987 · 123 citations

Natural Sciences, Materials Engineering, Materials Science +17

Kinetics of compound formation in thin film couples of Al and transition metals

J. K. Howard, R. F. Lever, Patrick J. Smith et al. · Journal of Vacuum Science and Technology · 1976 · 110 citations

Natural Sciences, Chemistry, Materials Science +17

Low resistivity body-centered cubic tantalum thin films as diffusion barriers between copper and silicon

Philip Catania, J. P. Doyle, Jerome J. Cuomo · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 80 citations

Natural Sciences, Materials Engineering, Materials Science +17

Thin-film reactions of Al with Co, Cr, Mo, Ta, Ti, and W

E. G. Colgan, J. W. Mayer · Journal of materials research/Pratt's guide to venture capital sources · 1989 · 45 citations

Natural Sciences, Materials Engineering, Materials Science +12