Diffusion In Semiconductors

Diffusion in Semiconductors is a physical process within solid-state materials science wherein dopant atoms or point defects migrate through a semiconductor lattice via atomic-scale mechanisms driven by concentration gradients, thermal energy, or electric fields, distinguished from general diffusion in solids by its critical role in determining electronic properties and device performance in semiconductor technology.

961

Publications

53.3K

Citations

2.4K

Authors

578

Institutions

Publications per year

2017–2026

15

Authors

2.4K

  1. BT
    B. Tuck

    University of Nottingham, United Kingdom

    15 publications · 549 citations

    13

    h-index

  2. UG
    U. Gösele

    Max Planck Institute of Microstructure Physics, Germany

    14 publications · 622 citations

    12

    h-index

  3. DM
    D. Mathiot

    Centre National de la Recherche Scientifique, France

    10 publications · 296 citations

    10

    h-index

  4. NA
    N. A. Stolwijk

    University of Münster, Germany

    9 publications · 417 citations

    9

    h-index

  5. JF
    J. F. Gibbons

    Stanford University, United States

    9 publications · 465 citations

    9

    h-index

1–5 of 2.4K

Venues

  1. Journal of Applied Physics

    181 publications · 8.8K citations

    49

    h-index

  2. Applied Physics Letters

    135 publications · 6.4K citations

    42

    h-index

  3. Journal of The Electrochemical Society

    JES · 76 publications · 2.9K citations

    28

    h-index

  4. Physical review. B, Condensed matter

    PRB · 38 publications · 2K citations

    26

    h-index

  5. Physical Review Letters

    PRL · 27 publications · 1.9K citations

    23

    h-index

1–5