Dong‐Soo Yoon

The Effectiveness of Ta Prepared by Ion‐Assisted Deposition as a Diffusion Barrier Between Copper and Silicon

B.K. Kang, Sung‐Man Lee, Joon Seop Kwak et al. · Journal of The Electrochemical Society · 1997 · 31 citations

Engineering, Materials Engineering, Materials Science +17

Influence of AlN buffer layer thickness and deposition methods on GaN epitaxial growth

Jie Yang, Sang-Ki Kang, Duc V. Dinh et al. · Thin Solid Films · 2009 · 24 citations

Engineering, Materials Engineering, Materials Science +16

Role of cerium dioxide in a tantalum diffusion barrier film for a Cu/Ta+CeO2/Si structure

Dong‐Soo Yoon, Hong Koo Baik, Sung–Man Lee · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 21 citations

Engineering, Materials Engineering, Materials Science +17

Study on ta diffusion barrier in Al/Si system

Jae-Hwa Kim, Dong‐Soo Yoon, Joon Seop Kwak et al. · Journal of Electronic Materials · 1999 · 21 citations

Natural Sciences, Materials Engineering, Materials Science +12

Leakage Current Characteristics of (Ba,Sr)TiO₃ Thin Films Deposited on Ru Electrodes Prepared by Metal Organic Chemical Vapor Deposition

Deok-Sin Kil, Jong-Bum Park, Dong‐Soo Yoon et al. · Japanese Journal of Applied Physics · 2001 · 10 citations

Natural Sciences, Materials Engineering, Materials Science +17