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A 13 kV 4H-SiC n-Channel IGBT with Low R<sub>diff,on </sub>and Fast Switching
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2008
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EngineeringPower ElectronicsSemiconductor DeviceHigh Voltage EngineeringLow RdiffNanoelectronicsElectronic EngineeringKv BlockingMaterials EngineeringElectrical EngineeringBias Temperature InstabilityPower Semiconductor DeviceComputer EngineeringMicroelectronics4H-sic N-igbtPower DeviceApplied PhysicsFast SwitchingLow R
For the first time, high power 4H-SiC n-IGBTs have been demonstrated with 13 kV blocking and a low Rdiff,on of 22 mWcm2 which surpasses the 4H-SiC material limit for unipolar devices. Normally-off operation and >10 kV blocking is maintained up to 200oC base plate temperature. The on-state resistance has a slight positive temperature coefficient which makes the n-IGBT attractive for parallel configurations. MOS characterization reveals a low net positive fixed charge density in the oxide and a low interface trap density near the conduction band which produces a 3 V threshold and a peak channel mobility of 18 cm2/Vs in the lateral MOSFET test structure. Finally, encouraging device yields of 64% in the on-state and 27% in the blocking indicate that the 4H-SiC n-IGBT may eventually become a viable power device technology.