Effects of low-molecular-weight radicals for reduction of microloading in high-aspect contact-hole etching

Cross Section Measurements for Electron-Impact Dissociation of C₄F₈ into Neutral and Ionic Radicals

Hirotaka Toyoda Hirotaka Toyoda, Makoto Iio, Hideo Sugai Hideo Sugai · Japanese Journal of Applied Physics · 1997 · 82 citations

Natural Sciences, Chemistry, Physics +10

Ultrahigh frequency versus inductively coupled chlorine plasmas: Comparisons of Cl and Cl2 concentrations and electron temperatures measured by trace rare gases optical emission spectroscopy

M. V. Malyshev, Vincent M. Donnelly, Seiji Samukawa · Journal of Applied Physics · 1998 · 79 citations

Natural Sciences, Chemistry, Physics +16

Surface reaction of CF2 radicals for fluorocarbon film formation in SiO2/Si selective etching process

Muneto Inayoshi, Masafumi Ito, Masaru Hori et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 68 citations · Full text

Natural Sciences, Materials Science, Physics +14

New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes

Seiji Samukawa, Yukito Nakagawa, Tsutomu Tsukada et al. · Japanese Journal of Applied Physics · 1995 · 58 citations

Engineering, Electrical Engineering, Physics +14

New radical control method for high-performance dielectric etching with nonperfluorocompound gas chemistries in ultrahigh-frequency plasma

Seiji Samukawa, Tomonori Mukai, Ken‐ichiro Tsuda · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +13