Yukito Nakagawa

New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes

Seiji Samukawa, Yukito Nakagawa, Tsutomu Tsukada et al. · Japanese Journal of Applied Physics · 1995 · 58 citations

Engineering, Electrical Engineering, Physics +14

Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance

Noriyoshi Sato, Satoru Iizuka, Yukito Nakagawa et al. · Applied Physics Letters · 1993 · 44 citations · Full text

Engineering, Electrical Engineering, Physics +16

Low-temperature, uniform, and high-density plasma produced by a new ultra-high-frequency discharge with a spokewise antenna

Seiji Samukawa, Yukito Nakagawa, Tsutomu Tsukada et al. · Applied Physics Letters · 1995 · 39 citations

Natural Sciences, Electrical Engineering, Physics +13

High rate deposition of a-Si:H and a-SiNx:H by VHF PECVD

Toshiyuki Takagi, Kazushige Takechi, Yukito Nakagawa et al. · Vacuum · 1998 · 34 citations

Engineering, Materials Engineering, Materials Science +13

Etching Characteristics by M= 0 Helicon Wave Plasma

Tsutomu Tsukada, Hiroshi Nogami, Yukito Nakagawa et al. · Japanese Journal of Applied Physics · 1994 · 25 citations

Engineering, Materials Engineering, Materials Science +17