Applied Physics Letters · 1993 · 44 citations · 9 references
EngineeringElectrical EngineeringPhysicsAntennasElectromagneticsPlasma PhysicsAntenna DesignAntenna RadiationMagnetized PlasmaMicrowave AntennasSlot AntennasAntenna Design For PlasmasAntenna-plasma InteractionDensityElectron Cyclotron Resonance Plasma SourcesMagnetic Field DistributionMagnetic Flux DistributionMicrowave Plasma SourcesMicrowave Plasmas
A uniform plasma is produced by a new plane slotted antenna with permanent magnets for the electron cyclotron resonance. The plasma is uniform within a few percent in a diameter of 25–30 cm at a distance of 25–30 cm from the antenna. The plasma density, 1.5×1010 cm−3 with electron temperature of 1.8 eV at a microwave power of 100 W, is almost proportional to the microwave power. A magnetic distribution provided by the magnets is essential for producing such a uniform plasma.
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