Concepedia

Seitaro Matsuo

SM

Statistics

Publications

20

Citations

1.2K

H-Index

15

Active since

1975

Affiliations

NTT (Japan)(Current)

NTT Basic Research Laboratories

Seitaro Matsuo is an author at NTT (Japan) specializing in materials science, materials engineering, and etching processes.

Publications per year

1975–2000

20

Publications

20

Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

Seitaro Matsuo, Mikiho Kiuchi · Japanese Journal of Applied Physics · 1983 · 395 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

Seitaro Matsuo, Yoshio Adachi · Japanese Journal of Applied Physics · 1982 · 148 citations

Engineering, Electrical Engineering, Microelectronics +12

Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering

Toshiro Ono, Chiharu Takahashi, Seitaro Matsuo · Japanese Journal of Applied Physics · 1984 · 132 citations

Natural Sciences, Materials Engineering, Materials Science +10

Reactive ion stream etching utilizing electron cyclotron resonance plasma

Toshiro Ono, M. Oda, Chiharu Takahashi et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1986 · 85 citations

Engineering, Materials Engineering, Materials Science +14

An electron cyclotron resonance plasma deposition technique employing magnetron mode sputtering

Chiharu Takahashi, Mikiho Kiuchi, Toshiro Ono et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 53 citations

Natural Sciences, Materials Engineering, Materials Science +15

1–5 of 20