High rate deposition of a-Si:H and a-SiNx:H by VHF PECVD - Concepedia

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High rate deposition of a-Si:H and a-SiNx:H by VHF PECVD

34

Citations

12

References

1998

Year

Toshiyuki Takagi, Kazushige Takechi, Yukito Nakagawa, Y. Watabe, Shinichi Nishida

High Rate DepositionElectrical EngineeringEngineeringNanoelectronicsSurface ScienceApplied PhysicsSemiconductor Device FabricationChemical DepositionChemical Vapor DepositionMicroelectronicsPlasma ProcessingElectrical Insulation

References

	Year	Citations

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