IEEE Transactions on Electron Devices · 1985 · 64 citations · 9 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportDevice ModelingIntegrated Circuit DesignMetal-oxide-semiconductor Field-effect TransistorsSemiconductor PhysicsSemiconductor SurfacesField-effect Transistor Transfer CharacteristicsGate DielectricsGate-dependent Current-voltage BehaviorInsulating MaterialsLow-frequency OscillationsMetal-semiconductor Field-effect TransistorsPhysical ModelsTransconductance
We investigate in detail two anomalies in metal-semiconductor field-effect transistors (MESFET) which are detrimental to their operation in a GaAs integrated circuit (IC). The first of these is side-gating and consists in a parasitic very-low-frequency transconductance between a MESFET and an isolated electrode or side gate sharing the same semi-insulating (SI) substrate. The second anomaly is kinetic and consists in a parasitic transient in the drain-source current following an abrupt change in drain-source voltage. The time constants of the transients are observed to be very sensitive to the side-gate electrode potential. The effects of different technological and operational parameters are studied. One surprising result is the very high sensitivity of side-gating to chemical wet and dry treatments and to dielectric encapsulation of the unprotected substrate surfaces. We also report low-frequency oscillations related to side-gating. Physical models are proposed and yield consistent interpretations of our experimental observations.
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Compensation mechanisms in GaAs
G. M. Martin, J. Farges, Guy Jacob et al. · Journal of Applied Physics · 1980 · 322 citations
Natural Sciences, Electrical Engineering, Materials Science +17